Intellectual property law in China

Responsibility
by Peter Ganea, Danny Friedmann, Jyh-An Lee, Douglas Clark ; edited by Christopher Heath
Publication
Alphen aan den Rijn : Kluwer Law International B.V., [2021]
Copyright notice
©2021
Physical description
xxi, 546 pages ; 25 cm
Series
Max Planck series on Asian intellectual property law ; 11.

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